Enhancement-Mode Accumulation Capacitance-Voltage Characteristics in TiN/ALD-Al2O3/Sputtered-MoS2 Top-Gated Stacks

Publication Information

Title

Japanese:
English:	Enhancement-Mode Accumulation Capacitance-Voltage Characteristics in TiN/ALD-Al2O3/Sputtered-MoS2 Top-Gated Stacks

Author

Japanese:	谷川晴紀, 松浦賢太朗, 宗田伊理也, 星井拓也, 角嶋邦之, 筒井一生, 若林整.
English:	Haruki Tanigawa, Kentaro Matsuura, Iriya Muneta, Takuya Hoshii, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics (JJAP)

Volume, Number, Page

Vol. 59

Published date

Apr. 2020

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: