原子層薄膜CaF<sub>2</sub>/Siヘテロ構造を用いたp 型共鳴トンネルダイオードの室温微分負性抵抗特性

Publication Information

Title

Japanese:	原子層薄膜CaF₂/Siヘテロ構造を用いたp 型共鳴トンネルダイオードの室温微分負性抵抗特性
English:	Room Temperature Negative Differential Resistance of Si/CaF₂ Double-barrier Resonant Tunneling Diodes

Author

Japanese:	三上萌, 福山聡史, 渡辺正裕.
English:	Kizashi Mikami, Satoshi Fukuyama, Masahiro Watanabe.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

p. 11-192

Published date

Mar. 9, 2019

Publisher

Japanese:	応用物理学会
English:

Conference name

Japanese:	第66回応用物理学会春季学術講演会
English:	The 66th The Japan Society of Applied Physics Spring Meeting

Conference site

Japanese:	東京
English:	Tokyo

Official URL