Negative Differential Resistance in CaF<sub>2</sub>/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process

Publication Information

Title

Japanese:
English:	Negative Differential Resistance in CaF₂/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process

Author

Japanese:	熊谷佳郎, 福山聡史, 利根川啓希, 三上萌, 廣瀬皓大, 冨澤勘太, 市川研佑, 渡辺正裕.
English:	Yoshiro Kumagai, Satoshi Fukuyama, Hiroki Tonegawa, Kizashi Mikami, Kodai Hirose, Kanta Tomizawa, Keisuke Ichikawa, Masahiro Watanabe.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 28, 2019

Publisher

Japanese:
English:	The Japan Society of Applied Physics

Conference name

Japanese:
English:	32nd International Microprocesses and Nanotechnology Conference (MNC2019)

Conference site

Japanese:	広島
English:	Hiroshima