Growth of extremely flat Bi(110) films on a Si(111)√3 × √3-B substrate

Publication Information

Title

Japanese:
English:	Growth of extremely flat Bi(110) films on a Si(111)√3 × √3-B substrate

Author

Japanese:	長瀬謙太郎, 潮田亮太, 中辻寛, Tetsuroh Shirasawa, 平山博之.
English:	Kentaro Nagase, Ryota Ushioda, Kan Nakatsuji, Tetsuroh Shirasawa, Hiroyuki Hirayama.

Language

English

Journal/Book name

Japanese:
English:	Applied Physics Express

Volume, Number, Page

Vol. 13 p. 085506 (4 pages)

Published date

July 10, 2020

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: