Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

Publication Information

Title

Japanese:
English:	Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

Author

Japanese:	MOATAZ Eissa, 御手洗拓矢, 雨宮智宏, 宮本恭幸, 西山伸彦.
English:	Moataz Eissa, Takuya Mitarai, Tomohiro Amemiya, Yasuyuki Miyamoto, Nobuhiko Nishiyama.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Volume 59 Number 12 p. 126502

Published date

Nov. 20, 2020

Publisher

Japanese:
English:	IOP publishing

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL