Wet Etching for Isolation of N-polar GaN HEMT Structure by Electrodeless Photo-Assisted Electrochemical Reaction

Publication Information

Title

Japanese:
English:	Wet Etching for Isolation of N-polar GaN HEMT Structure by Electrodeless Photo-Assisted Electrochemical Reaction

Author

Japanese:	青田智也, 早坂明泰, 眞壁勇夫, 吉田成輝, 後藤高寛, 宮本恭幸.
English:	Tomoya Aota, Akihiro Hayasaka, isao makabe, Shigeki Yoshida, Takahiro Gotow, YASUYUKI MIYAMOTO.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Nov. 2020

Publisher

Japanese:
English:

Conference name

Japanese:	33rd International Microprocesses and Nanotechnology Conference (MNC 2020)
English:

Conference site

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English: