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Publication Information
Title
Japanese:
English:
Preparation of 1 μm-thick Y-doped HfO2 ferroelectric films on (111)Pt/TiOx/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties
Author
Japanese:
志村 礼司郎
,
三村 和仙
,
舘山 明紀
,
清水 荘雄
,
山田 智明
,
舟窪 浩
.
English:
Reijiro Shimura
,
Takanori Mimura
,
Akinori Tateyama
,
Takao Shimizu
,
Tomoaki Yamada
,
Hiroshi Funakubo
.
Language
English
Journal/Book name
Japanese:
English:
Jpn. J. Appl. Phys.
Volume, Number, Page
vol. 60 pp. 031009
Published date
Mar. 2021
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.35848/1347-4065/abe72e
©2007
Tokyo Institute of Technology All rights reserved.