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Publication Information
Title
Japanese:
English:
Normally-off sputtered-MoS2 nMISFETs with TiN top-gate electrode all defined by optical lithography for chip-level integration
Author
Japanese:
松浦 賢太朗
,
濱田 昌也
,
濱田 拓也
,
谷川 晴紀
,
坂本 拓朗
, Atsushi Hori,
宗田 伊理也
,
川那子 高暢
,
角嶋 邦之
,
筒井 一生
.
English:
Kentaro Matsuura
,
Masaya Hamada
,
Takuya Hamada
,
Haruki Tanigawa
,
Takuro Sakamoto
, Atsushi Hori,
Iriya Muneta
,
Takamasa Kawanago
,
Kuniyuki Kakushima
,
Kazuo
.
Language
English
Journal/Book name
Japanese:
English:
Japanese Journal of Applied Physics (JJAP) (Rapid Communication)
Volume, Number, Page
Vol. 59 No. 8 Page 80906
Published date
Aug. 2020
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.35848/1347-4065/aba9a3
©2007
Tokyo Institute of Technology All rights reserved.