Importance of Crystallinity Improvement in MoS2 film just after MoS2-Compound Sputtering even followed by Post Sulfurization for Chip-Size Fabrication

Publication Information

Title

Japanese:
English:	Importance of Crystallinity Improvement in MoS2 film just after MoS2-Compound Sputtering even followed by Post Sulfurization for Chip-Size Fabrication

Author

Japanese:	今井慎也, 濱田拓也, 濱田昌也, 白倉孝典, 宗田伊理也, 角嶋邦之, Tetsuya Tatsumi, Shigetaka Tomiya, 筒井一生, 若林整.
English:	Shinya Imai, Takuya Hamada, Masaya Hamada, Takanori Shirokura, Iriya Muneta, Kuniyuki Kakushima, Tetsuya Tatsumi, Shigetaka Tomiya, Kazuo Tsutsui, Hitoshi Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics (JJAP) （SSDM特集号）

Volume, Number, Page

Vol. 60 Page SBBH10

Published date

Feb. 2021

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI