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Publication Information
Title
Japanese:
English:
Self-Aligned-TiSi2 Bottom Contact with APM Cleaning and Post-annealing for Sputtered-MoS2 Film
Author
Japanese:
五十嵐 智
, Yusuke Mochiduki,
谷川 晴紀
,
濱田 昌也
,
松浦 賢太朗
,
宗田 伊理也
,
角嶋 邦之
,
筒井 一生
,
若林 整
.
English:
Satoshi Igarashi
, Yusuke Mochiduki,
Haruki Tanigawa
,
Masaya Hamada
,
Kentaro Matsuura
,
Iriya Muneta
,
Kuniyuki Kakushima
,
Kazuo Tsutsui
,
Hitoshi Wakabayashi
.
Language
English
Journal/Book name
Japanese:
English:
Japanese Journal of Applied Physics (JJAP) (SSDM特集号)
Volume, Number, Page
Vol. 60 Page SBBH04
Published date
Jan. 2021
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.35848/1347-4065/abd535
©2007
Tokyo Institute of Technology All rights reserved.