Low Contact Resistance at Interface between Sputtered-MoS2 Film and TiSi2 Contact Treated by Higher-Temperature Forming-Gas Annealing

Publication Information

Title

Japanese:
English:	Low Contact Resistance at Interface between Sputtered-MoS2 Film and TiSi2 Contact Treated by Higher-Temperature Forming-Gas Annealing

Author

Japanese:	五十嵐智, Yusuke Mochiduki, 谷川晴紀, 濱田昌也, 松浦賢太朗, 宗田伊理也, 角嶋邦之, 筒井一生, 若林整.
English:	Satoshi Igarashi, Yusuke Mochiduki, Haruki Tanigawa, Masaya Hamada, Kentaro Matsuura, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 2020

Publisher

Japanese:
English:

Conference name

Japanese:
English:	International Conference of Solid State Devices and Materials (SSDM) 2020

Conference site

Japanese:
English: