Sputtering deposition and characterization of BiSb topological insulator - ferromagnet multilayers

Publication Information

Title

Japanese:	BiSbトポロジカル絶縁体 - 磁性体多層膜のスパッタリング法による製膜と評価
English:	Sputtering deposition and characterization of BiSb topological insulator - ferromagnet multilayers

Author

Japanese:	脱凡.
English:	Fan Tuo.

Type

Type:	Thesis (Ph.D.) Outline
Country:	Japan

Language

English

Organization name

Tokyo Institute of Technology

Report number

Conferred date

Judge