Data augmentation in EUV lithography simulation based on convolutional neural network

Publication Information

Title

Japanese:
English:	Data augmentation in EUV lithography simulation based on convolutional neural network

Author

Japanese:	田邊容由, 高橋篤司.
English:	Hiroyoshi Tanabe, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

May 26, 2022

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Proc. SPIE 12052, Advanced Lithography + Patterning 2022, 120520T

Conference site

Japanese:
English:	California

File

DOI