シミュレーテッド量子アニーリングを用いたマスク最適化手法

Publication Information

Title

Japanese:	シミュレーテッド量子アニーリングを用いたマスク最適化手法
English:	Mask Optimization Method Using Simulated Quantum Annealing

Author

Japanese:	小平行秀, 中山晴貴, 野中尚貴, 松井知己, 高橋篤司, 児玉親亮.
English:	Yukihide Kohira, Haruki Nakayama, Naoki Nonaka, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama.

Language

Japanese

Journal/Book name

Japanese:	電子情報通信学会技術研究報告 (VLD2021-45)
English:	IEICE Technical Report (VLD2021-45)

Volume, Number, Page

Vol. 121 No. 277 pp. 162-167

Published date

Dec. 2021

Publisher

Japanese:
English:

Conference name

Japanese:	VLSI設計技術研究会
English:	Technical Committee on VLSI Design Technologies

Conference site

Japanese:
English: