Effects of Annealing on Thermal Boundary Resistance of Low-k Interlayer Dielectrics

Publication Information

Title

Japanese:	Low-k 層間絶縁膜の界面熱抵抗に与えるアニーリング処理の効果
English:	Effects of Annealing on Thermal Boundary Resistance of Low-k Interlayer Dielectrics

Author

Japanese:	徐茂, 曹志, 沖野晃俊, ジャン天卓.
English:	Mao Xu, Zhi Cao, Akitoshi Okino, Tianzhuo Zhan.

Language

English

Journal/Book name

Japanese:	第70回応用物理学会春季学術講演会講演予稿集
English:	Extended abstracts of the 70th JSAP spring meeting

Volume, Number, Page

16p-A403-18

Published date

Mar. 16, 2023

Publisher

Japanese:	公益社団法人応用物理学会
English:	The Japan Society of Applied Physics

Conference name

Japanese:	The 70th JSAP Spring Meeting 2023
English:

Conference site

Japanese:
English:	Tokyo

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