Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns

Publication Information

Title

Japanese:
English:	Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns

Author

Japanese:	田邊容由, 神宮司明良, 高橋篤司.
English:	Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Proc. SPIE 12495, Advanced Lithography + Patterning 2023, 124951J

Volume, Number, Page

Published date

Apr. 28, 2023

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:	California

DOI