Growth kinetics of a perfectly flat Bi(110) film during low-temperature deposition and subsequent annealing

Publication Information

Title

Japanese:
English:	Growth kinetics of a perfectly flat Bi(110) film during low-temperature deposition and subsequent annealing

Author

Japanese:	M. Shimura, T. Shirasawa, R. Ushioda, K. Nakatsuji, H. Hirayama.
English:	M. Shimura, T. Shirasawa, R. Ushioda, K. Nakatsuji, H. Hirayama.

Language

English

Journal/Book name

Japanese:
English:	Surface Science

Volume, Number, Page

Volume 728 122210

Published date

Feb. 2023

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: