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Title
Japanese: 
English:Evaluation method of plasma fluctuation using stochastic model 
Author
Japanese: 島田陽介, 赤塚洋.  
English: Yosuke Shimada, Hiroshi Akatsuka.  
Language English 
Journal/Book name
Japanese: 
English:Proceedings of 44th International Symposium on Dry Process (DPS2023) 
Volume, Number, Page         pp. 93-94
Published date Nov. 20, 2023 
Publisher
Japanese: 
English:Organizing Committee of 44th International Symposium on Dry Process 
Conference name
Japanese: 
English:44th International Symposium on Dry Process (DPS2023) 
Conference site
Japanese:名古屋 
English:Nagoya 
Official URL http://www.dry-process.org/2023/poster_program.html
 
Abstract Recently, fluctuation of plasma has been discussed not only in field of nuclear fusion but also semiconductor etching. New evaluation method is proposed using stochastic model for prediction of plasma fluctuation based on collisional-radiative model. Electron impact excitation of atoms is considered as a Wiener process. Revised Wiener process is applied to analyze change of densities of excited-level populations in short time by Malliavin derivative. By using this method, the density fluctuation is evaluated from the view point of contribution of electron collision

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