349 mm atmospheric linear type plasma source for 12-inch semiconductor surface processing

Publication Information

Title

Japanese:
English:	349 mm atmospheric linear type plasma source for 12-inch semiconductor surface processing

Author

Japanese:	古谷淳之介, 大澤泰樹, 八井田朱音, 西山伸彦, 沖野晃俊.
English:	Junnosuke Furuya, Taiki Osawa, Akane Yaida, Nobuhiko Nishiyama, AKITOSHI OKINO.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 2, 2024

Publisher

Japanese:
English:

Conference name

Japanese:
English:	The 77th Annual Gaseous Electronics Conference

Conference site

Japanese:	サンディエゴ
English: