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Title
Japanese:発光分光法とデータサイエンス手法による減圧プラズマの 電子温度・密度計測の高度化 
English:Advances in Measurements of Electron Temperature and Density in Low-pressure Plasmas Using Optical Emission Spectroscopy and Data Science Techniques 
Author
Japanese: 赤塚洋.  
English: Hiroshi Akatsuka.  
Language Japanese 
Journal/Book name
Japanese:シリコンテクノロジー 
English: 
Volume, Number, Page        
Published date Feb. 27, 2025 
Publisher
Japanese:応用物理学会シリコンテクノロジー分科会 
English: 
Conference name
Japanese:第257回 研究集会 ナノ・マイクロファブリケーション研究委員会 
English: 
Conference site
Japanese:東京 
English:Tokyo 
Official URL https://annex.jsap.or.jp/silicon/activity/studyGroup/257
 
Abstract This presentation reports measurement method of electron temperature and density resolved spatially by optical emission spectroscopy of low-pressure inductively-coupled argon plasma, and of low-pressure plasma for plasma etching using argon as the parent gas. In order to interpret the spectral intensity of observed lines, a collisional-radiative model must be employed. Recently, there has been progress in the method of searching for input values of electron temperature and density that can reproduce the measured level density as accurately as possible by directly applying the CR model. It was necessary to investigate the parameter dependence of each level density over a wide range of electron temperature and density, but the application of the trust region method made it possible to perform simple measurements. Recent advances in tomographic spatially resolved measurement techniques are also presented.

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