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Title
Japanese:プロセスプラズマの基礎と分光計測の最近の成果 
English:undamentals of Processing Plasmas and Recent Results of their Spectroscopic Measurements 
Author
Japanese: 赤塚 洋.  
English: Hiroshi Akatsuka.  
Language Japanese 
Journal/Book name
Japanese:第3回 プラズマ・核融合若手夏の学校 テキスト 
English: 
Volume, Number, Page        
Published date Aug. 26, 2025 
Publisher
Japanese:プラズマ・核融合若手夏の学校 事務局 
English: 
Conference name
Japanese:第3回 プラズマ・核融合若手夏の学校 
English: 
Conference site
Japanese:仙台 
English: 
Official URL https://pfyss.org/index.html
 
Abstract This course will cover the fundamentals and measurement of process plasmas. It will begin with a brief introduction of industrial applications and social impacts, and introduce recent research results in the fields of various plasma sources that support process technologies, mainly semiconductor applications, the fundamentals of interactions with solid surfaces and sheaths, and emission spectroscopy of reactive plasmas.

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