Electrodeposition of Ruthenium on Copper and Titanium Substrates:  A Comparative Study of Current Efficiency

Publication Information

Title

Japanese:
English:	Electrodeposition of Ruthenium on Copper and Titanium Substrates: A Comparative Study of Current Efficiency

Author

Japanese:	HU ZHITAO, 栗岡智行, Yung-Jung Hsu, Chang Tso-Fu Mark, 町田克之, 伊藤浩之, 三宅美博, 曽根正人.
English:	Zhitao Hu, Tomoyuki Kurioka, Yung-Jung Hsu, Tso-Fu Mark Chang, Katsuyuki Machida, Hiroyuki Ito, Yoshihiro Miyake, Masato Sone.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Nov. 2025

Publisher

Japanese:
English:

Conference name

Japanese:
English:	2025 MRS-Taiwan Annual Meeting

Conference site

Japanese:
English:	Hsinchu