Investigation of magnet placement effect on plasma density and etching profile in Si plasma etching | Science Tokyo Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Investigation of magnet placement effect on plasma density and etching profile in Si plasma etching

Author

Japanese:	遠西美重, 佐藤美那, 松谷晃宏.
English:	Mie Tohnishi, Mina Sato, Akihiro Matsutani.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Nov. 2025

Publisher

Japanese:
English:

Conference name

Japanese:
English:	MNC 2025

Conference site

Japanese:
English:	Tokyo

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