Large Spin Hall Angle in Highly-Textured Sputtered BiSb (012) Topological Insulator on Si/SiO2 Substrates Enabled by Buffer/Seed Stack

Publication Information

Title

Japanese:
English:	Large Spin Hall Angle in Highly-Textured Sputtered BiSb (012) Topological Insulator on Si/SiO2 Substrates Enabled by Buffer/Seed Stack

Author

Japanese:	HO HOANG HUY, 李文韜, ﾌｧﾑｳﾞｧﾝﾄｩｱﾝ, Shigeyuki Hirayama, Yushi Kato, PHAM NAM HAI.
English:	Ho Hoang Huy, Li Wentao, Pham Van Thuan, Shigeyuki Hirayama, Yushi Kato, Pham Nam Hai.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Apr. 13, 2026

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Intermag 2026

Conference site

Japanese:
English:	Manchester