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Title
Japanese: 
English:Impacts of fabrication technology on scattering and backscattering in silicon waveguides 
Author
Japanese: 堀川 剛, 西山 伸彦.  
English: Tsuyoshi Horikawa, Nobuhiko Nishiyama.  
Language English 
Journal/Book name
Japanese: 
English:Proceedings of IEEE SiPhotonics 2026 
Volume, Number, Page        
Published date Apr. 13, 2026 
Publisher
Japanese: 
English:IEEE 
Conference name
Japanese:IEEE SiPhotonics 2026 
English: 
Conference site
Japanese:オタワ 
English:Ottawa 
Abstract The scattering and backscattering characteristics of silicon single-mode waveguides fabricated using different lithography techniques were investigated through OFDR profiles. Waveguides fabricated with high-resolution lithography exhibited consistent reductions in both propagation and backpropagation losses compared with those produced using low-resolution lithography.

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