Source-position-dependent transmission cross coefficient formula including polarization and mask three-dimensional effects in high-numerical-aperture extreme ultraviolet lithography

Publication Information

Title

Japanese:
English:	Source-position-dependent transmission cross coefficient formula including polarization and mask three-dimensional effects in high-numerical-aperture extreme ultraviolet lithography

Author

Japanese:	田邊容由, 杉山萌, 下田将之, 高橋篤司.
English:	Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Journal of Micro/Nanopatterning, Materials and Metrology (JM3)

Volume, Number, Page

Vol. 25 issue 3

Published date

May 4, 2026

Publisher

Japanese:
English:	SPIE

Conference name

Japanese:
English:

Conference site

Japanese:
English:

File

DOI