Improving Ruthenium Electrodeposition for Interconnect Applications through Substrate and Mass-Transport Control

Publication Information

Title

Japanese:
English:	Improving Ruthenium Electrodeposition for Interconnect Applications through Substrate and Mass-Transport Control

Author

Japanese:	HU ZHITAO, 侯文鼎, 栗岡智行, 彦坂元, Chang Tso-Fu Mark, 町田克之, 伊藤浩之, 三宅美博, 曽根正人.
English:	Zhitao Hu, Wending Hou, Tomoyuki Kurioka, Gen Hikosaka, Tso-Fu Mark Chang, Katsuyuki Machida, Hiroyuki Ito, Yoshihiro Miyake, Masato Sone.

Language

English

Journal/Book name

Japanese:
English:	European Materials Research Society

Volume, Number, Page

Published date

Sept. 14, 2026

Publisher

Japanese:
English:

Conference name

Japanese:
English:	European Materials Research Society

Conference site

Japanese:
English:	Warsaw