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Title
Japanese:
Effects of Microelectrode Pattern Density on Electroplated Film Thickness Distribution for MEMS Device Fabrication
English:
Effects of Microelectrode Pattern Density on Electroplated Film Thickness Distribution for MEMS Device Fabrication
Author
Japanese:
Kota Sakanashi,
Tomoyuki Kurioka
,
Gen Hikosaka
,
Katsuyuki Machida
,
Shinichi Iida
,
Chun-Yi Chen
,
Tso-Fu Mark Chang
,
Hiroyuki Ito
,
Yoshihiro Miyake
,
Masato Sone
.
English:
Kota Sakanashi,
Tomoyuki Kurioka
,
Gen Hikosaka
,
Katsuyuki Machida
,
Shinichi Iida
,
Chun-Yi Chen
,
Tso-Fu Mark Chang
,
Hiroyuki Ito
,
Yoshihiro Miyake
,
Masato Sone
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
Nov. 2026
Publisher
Japanese:
English:
Conference name
Japanese:
2026 International Conference on Green Electrochemical Technologies (2026 ICGET-Tw)
English:
2026 International Conference on Green Electrochemical Technologies (2026 ICGET-Tw)
Conference site
Japanese:
English:
Taoyuan
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Institute of Science Tokyo All rights reserved.