Novel SOI Fabrication Process Utilizing the Selective Etching for Si/Ge Stacked Layers: Separation By Bonding Si Islands Technology(SBSI)
著者
和文:
S. Ohmi,
H. Ohri,
T. Yamazaki,
M. Sakuraba,
J. Murota,
T. Sakai.
英文:
S. Ohmi,
H. Ohri,
T. Yamazaki,
M. Sakuraba,
J. Murota,
T. Sakai.
言語
English
掲載誌/書名
和文:
英文:
Third Internatinal Workshop on New Group Ⅳ (Si-Ge-C) Semiconductors: Control of Properties and Applications to Ultrahigh Speed and Opto-Electronic Devices
各種検索
サポート
ヘルプ