Role of Seed Crystal Layer in Two-Step-Growth Procedure for Low Temperature Growth of Polycrystalline Silicon Thin Film from SiF4 by a Remote-Type Microwave Plasma Enhanced Chemical Vapor Deposition
著者
和文:
Toshio KAMIYA,
Kazuyoshi RO,
Charles Michael FORTMANN,
Isamu SHIMIZU.
英文:
Toshio KAMIYA,
Kazuyoshi RO,
Charles Michael FORTMANN,
Isamu SHIMIZU.