Structural properties of polycrystalline silicon films having varied textures fabricated with intentional control of surface reactions using SiF4/H2/SiH4 mixing gas
著者
和文:
T. Kamiya,
K. Nakahata,
C.M. Fortmann,
I. Shimizu.
英文:
T. Kamiya,
K. Nakahata,
C.M. Fortmann,
I. Shimizu.
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