Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4 Mixture Gases Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties
著者
和文:
K. Nakahata,
K.Ro,
A.Suemasu,
T. Kamiya,
C.M.Fortmann,
I. Shimizu.
英文:
K. Nakahata,
K.Ro,
A.Suemasu,
T. Kamiya,
C.M.Fortmann,
I. Shimizu.
各種検索
サポート
ヘルプ