New Photoresist Materials for 157 nm Lithography. Poly[Vinylsulfonyl Fluoride-co-4(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)styrene] Partially Protected with tert-Butoxycarbonyl
著者
和文:
T. Fujigaya,
Y. Shibasaki,
S. Ando,
S. Kishimura,
M. Endo,
M. Sasago,
M. Ueda.
英文:
T. Fujigaya,
Y. Shibasaki,
S. Ando,
S. Kishimura,
M. Endo,
M. Sasago,
M. Ueda.
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