Dependence of gas gain on x-ray-absorbed position in the proportional counter
著者
和文:
Sakurai, I.,
Mihara, T.,
河合 誠之,
Yoshida, A.,
Shirasaki, Y.,
Matuoka, M.,
Sugizaki, M.,
Kamae, T. ..
英文:
Sakurai, I.,
Mihara, T.,
Kawai, N.,
Yoshida, A.,
Shirasaki, Y.,
Matuoka, M.,
Sugizaki, M.,
Kamae, T. ..
言語
English
掲載誌/書名
和文:
英文:
Proc. SPIE Vol. 4140, p. 511-519, X-Ray and Gamma-Ray Instrumentation for Astronomy XI, Kathryn A. Flanagan; Oswald H. Siegmund; Eds.
巻, 号, ページ
Vol. 4140
pp. 511-519
出版年月
2000年12月
出版者
和文:
英文:
会議名称
和文:
英文:
開催地
和文:
英文:
アブストラクト
The position dependency of gas amplification in the proportional counter (PC) is investigated. We have been developing one-dimensional position sensitive PCs for MAXI/GSC and HETE/WXM and found that anomalous gas amplification occurs in a high bias voltage, even while the PC is still operated in the proportional region. This effect depends on the position where the X-ray is absorbed. Therefore it appears as a hard tail, a soft tail, or a broad peak in the traditional PC, depending on the shape of the gain curve across the cell. It degrades the apparent energy resolution. Especially, a position sensitive proportional counter (PSPC) is operated with rather high bias voltage to give higher positional resolution. We encounter the difficulty to achieve good position and energy resolutions at the same time. In this work, we have examined the anomalous gas amplification for various gas mixtures of Xe + CO2, Ar + CO2 and Ar + CH4, for gas gain up to approximately 20000, and for energies from 6 to 17 keV to understand the phenomena.
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