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タイトル
和文:半導体用高速熱処理用ゾーンコントロール誘導加熱装置 
英文:A Zone-Control Induction Heating (ZCIH) System for Semiconductor Processing 
著者
和文: 藤田英明, 尾崎一博, 内田直喜.  
英文: Hideaki Fujita, Kazuhiro Ozaki, Naoki Uchida.  
言語 Japanese 
掲載誌/書名
和文:電気学会論文誌D 
英文:IEEJ Trans. IA 
巻, 号, ページ vol. 128    no. 3    pp. 296-302
出版年月 2008年3月 
出版者
和文:電気学会 
英文:Institute of Electrical Engineering in Japan 
会議名称
和文: 
英文: 
開催地
和文: 
英文: 
アブストラクト This paper proposes a new induction heating technology capable of controlling a precise exothermic distribution, which is named as “zone-control induction heating (ZCIH).” The ZCIH system consists of two or more sets of a high-frequency inverter unit and a work coil. The inverter units control the phase angle of the coil current to be in phase with each other. The ZCIH has capability of operation with the mutual inductance, and enables to locate the coils as close as possible. As a result, the ZCIH technology makes it possible to achieve rapid heating performance with extremely precise exothermic distribution. This paper presents experimental results of a 150-kW six-zone ZCIH system for semiconductor heat processing.

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