We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the
base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ
observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports
this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping
ZnO substrates in an HCl solution (HCl : H2O ¼ 7 : 200) for 30 s.
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