It is developed and experimentally demonstrated the novel method of etching metal with ozone-water. Ozone-water
was generated by bubbling ozone gas through pure water by absorption effect. Cr was used as a test metal. We
evaluated the fundamental performance of etching speed depend on temperature and concentration of ozone. The best
etching rate during tested conditions is 27nm/hours at 55?C. The roughness on the surface of both etched with a
conventional Cr etchant and the ozone-water. As a result, the ozone-water etched surface (Ra=0.94±0.19) was much
smoother than that with conventional etchant (2.61±0.77). While the etching rate is much slower than conventional
etchant, enough practical etching rates with atomically flat surface will meet various applications in nanotechnology
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