Home >

news ヘルプ

論文・著書情報


タイトル
和文: 
英文:Properties of Si/SiO2 superlattice nanodisc array prepared by nanosphere lithography 
著者
和文: 比嘉 隆也, Ryousuke Ishikawa, 宮島 晋介, 小長井 誠.  
英文: Takaya Higa, Ryousuke Ishikawa, Shinsuke Miyajima, Makoto Konagai.  
言語 English 
掲載誌/書名
和文: 
英文:SPIE Proceedings 
巻, 号, ページ Vol. 9178        pp. 91780P
出版年月 2014年10月7日 
出版者
和文: 
英文: 
会議名称
和文: 
英文:SPIE Optics + Photonics 2014 Conference 9178 Next Generation Technology for Solar Energy Conversion V 
開催地
和文: 
英文:San Diego, California 
DOI https://doi.org/10.1117/12.2061472
アブストラクト We fabricated nanostructured Si/SiO2 superlattice films for solar cell appliactions. The Si/SiO2 superlattice films were fabricated by thermal annealing of a-Si/SiO2 superlattice films. TEM observations revealed the existence of nanocrystalline Si in the Si layer. This sample showed photoluminescence spectrum with peak energy at around 1.5 eV. It was also found that the defect density in the superlattice was reduced by using forming gas annealing. Applying nanosphere lithography and reactive ion etching, we successfully prepared nanostructures on the surface of the superlattice. We also compared the optical properties with the simulation results using rigorous coupled wave analysis.

©2007 Institute of Science Tokyo All rights reserved.