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タイトル
和文: 
英文:Room Temperature High Peak-to-valley Current Ratio of CaF2/Si Triple-barrier Resonant-tunneling Diode Grown on Si 
著者
和文: 利根川啓希, 熊谷佳郎, 福山聡史, 廣瀬皓大, 渡辺正裕.  
英文: Hiroki Tonegawa, Yoshiro Kumagai, Satoshi Fukuyama, Koudai Hirose, MASAHIRO WATANABE.  
言語 English 
掲載誌/書名
和文: 
英文: 
巻, 号, ページ        
出版年月 2018年9月9日 
出版者
和文: 
英文: 
会議名称
和文: 
英文:The 2018 International Conference on Solid State Devices and Materials 
開催地
和文:東京 
英文:Tokyo 
アブストラクト Room temperature Negative Differential Resistance (NDR) with peak-to-valley current ratio (PVCR) as high as 105 and with peak current density (Jpeak) larger than 100 kA/cm2 has been demonstrated using atomically-thin-CaF2 energy barrier layers and Si quantum-wells triple-barrier resonant tunneling diode (RTD) structures. NDR characteristics were reasonably explained using theoretical analysis using simple model based on Esaki-Tsu formula and transfer matrix method.

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