Effect of hydrogen plasma treatment for ultra-wide bandgap amorphous oxide semiconductor, amorphous Ga-O

論文・著書情報

タイトル

和文:	Effect of hydrogen plasma treatment for ultra-wide bandgap amorphous oxide semiconductor, amorphous Ga-O
英文:	Effect of hydrogen plasma treatment for ultra-wide bandgap amorphous oxide semiconductor, amorphous Ga-O

著者

和文:	Keisuke Ide, Yurika Kasai, Kosuke Takenaka, Yuichi Setsuhara, Atsushi Hiraiwa, Hiroshi Kawarada, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya.
英文:	Keisuke Ide, Yurika Kasai, Kosuke Takenaka, Yuichi Setsuhara, Atsushi Hiraiwa, Hiroshi Kawarada, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya.

言語

English

掲載誌/書名

和文:
英文:

巻, 号, ページ

出版年月

2019年10月3日

出版者

和文:
英文:

会議名称

和文:	The 4th International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-4)
英文:	The 4th International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-4)

開催地

和文:
英文: