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Takumi Ohashi Researcher Information
Family Name |
大橋 |
Ohashi |
First Name |
匠 |
Takumi |
Organization |
Tokyo Institute of Technology
School of Environment and Society
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Title |
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ORCID ID |
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Area of Supervision : Primary |
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Research Bases |
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Research Theme |
Transition design, human-centered design, co-design, design cognition, cognitive psychology, electrical and electronic engineering |
Researcher Profile |
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Lecture Note |
TokyoTech Open Course Ware |
Degree |
MoS2 Film Formation by RF Magnetron Sputtering for Thin Film Transistors,
Outline,
Doctor (Engineering),
Tokyo Institute of Technology,
2018/03/26,
MoS2 Film Formation by RF Magnetron Sputtering for Thin Film Transistors,
Exam Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2018/03/26,
MoS2 Film Formation by RF Magnetron Sputtering for Thin Film Transistors,
Thesis,
Doctor (Engineering),
Tokyo Institute of Technology,
2018/03/26,
MoS2 Film Formation by RF Magnetron Sputtering for Thin Film Transistors,
Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2018/03/26,
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