A Study of Reactive Ion Beam Etching Process for Optoelectronic Micro-Devices | Science Tokyo Research Repository (T2R2)

Publication Information

Title

Japanese:	極微光デバイス製作のための反応性イオンビームエッチングに関する研究
English:	A Study of Reactive Ion Beam Etching Process for Optoelectronic Micro-Devices

Author

Japanese:	松谷晃宏.
English:	akihiro matsutani.

Type

Type:	Thesis (Ph.D.)
Country:	Japan

Language

English

Organization name

Tokyo Institute of Technology

Report number

乙第3270号

Conferred date

1999/02/28

Judge

File

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