Quantitative relationship between sputter-deposited-MoS2 properties and underlying-SiO2 surface roughness

Publication Information

Title

Japanese:
English:	Quantitative relationship between sputter-deposited-MoS2 properties and underlying-SiO2 surface roughness

Author

Japanese:	大橋匠, 宗田伊理也, 角嶋邦之, 筒井一生, 若林整.
English:	Takumi Ohashi, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:	Applied Physics Express

Volume, Number, Page

Vol. 10

Published date

Mar. 2017

Publisher

Japanese:
English:	IOP Publishing

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL

DOI