Ohmic Contact between Titanium and Sputtered MoS2 Films achieved by Forming-Gas Annealing

Publication Information

Title

Japanese:
English:	Ohmic Contact between Titanium and Sputtered MoS2 Films achieved by Forming-Gas Annealing

Author

Japanese:	M. Toyama, 大橋匠, 松浦賢太朗, 清水淳一, 宗田伊理也, 角嶋邦之, 筒井一生, 若林整.
English:	M. Toyama, T. Ohashi, K. Matsuura, J. Shimizu, I. Muneta, K. Kakushima, K. Tsutsui, H. Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:	JPN J APPL PHYS

Volume, Number, Page

57 07MA04

Published date

June 2018

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: