High-Mobility and Low-Carrier-Density Sputtered-MoS2 Film by Low-Temperature Forming-Gas Annealing for 3D-IC

Publication Information

Title

Japanese:
English:	High-Mobility and Low-Carrier-Density Sputtered-MoS2 Film by Low-Temperature Forming-Gas Annealing for 3D-IC

Author

Japanese:	清水淳一, 大橋匠, 松浦賢太朗, 宗田伊理也, 角嶋邦之, 筒井一生, 若林整.
English:	J. Shimizu, T. Ohashi, K. Matsuura, I. Muneta, K. Kakushima, K. Tsutsui, H. Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 2016

Publisher

Japanese:
English:

Conference name

Japanese:
English:	International Conference on Solid State Devices and Materials

Conference site

Japanese:	筑波
English:	Tsukuba