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Publication Information
Title
Japanese:
Crystallinity Improvement using Migration-Enhancement Methods for Sputtered-MoS2 Films
English:
Crystallinity improvement using migration-enhancement methods for sputtered-MoS2 films
Author
Japanese:
S. Hirano,
清水 淳一
,
松浦 賢太朗
,
大橋 匠
,
宗田 伊理也
,
角嶋 邦之
,
筒井 一生
,
若林 整
.
English:
S. Hirano,
J. Shimizu
,
K. Matsuura
,
T. Ohashi
,
I. Muneta
,
K. Kakushima
,
K. Tsutsui
,
H. Wakabayashi
.
Language
English
Journal/Book name
Japanese:
2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
English:
2017 IEEE Electron Device Technology and Manufacturing Conference (EDTM)
Volume, Number, Page
pp. 234-235
Published date
June 2017
Publisher
Japanese:
English:
Conference name
Japanese:
English:
2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
Conference site
Japanese:
富山
English:
Toyama
Official URL
http://ieeexplore.ieee.org/document/7947578/
DOI
https://doi.org/10.1109/EDTM.2017.7947578
©2007
Institute of Science Tokyo All rights reserved.