TiN/Ti Ohmic Contact for Sputtered-MoS2 Film using Forming-Gas Annealing

Publication Information

Title

Japanese:
English:	TiN/Ti Ohmic Contact for Sputtered-MoS2 Film using Forming-Gas Annealing

Author

Japanese:	外山真矢人, 大橋匠, 松浦賢太朗, 清水淳一, 宗田伊理也, 角嶋邦之, 筒井一生, 若林整.
English:	M. Toyama, T. Ohashi, K. Matsuura, J. Shimizu, I. Muneta, K. Kakushima, K. Tsutsui, H. Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 19, 2017

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Advanced Metallization Conference 2017: 27th Asian Session

Conference site

Japanese:
English:	Tokyo

Official URL