Chip-Level-Integrated nMISFETs with Sputter-Deposited-MoS2 Thin Channel Passivated by Al2O3 Film and TiN Top Gate

Publication Information

Title

Japanese:
English:	Chip-Level-Integrated nMISFETs with Sputter-Deposited-MoS2 Thin Channel Passivated by Al2O3 Film and TiN Top Gate

Author

Japanese:	松浦賢太朗, 清水淳一, 外山真矢人, 大橋匠, 宗田伊理也, S. Ishihara, 角嶋邦之, 筒井一生, 小椋厚志, 若林整.
English:	K. Matsuura, J. Shimizu, M. Toyama, T. Ohashi, I. Muneta, S. Ishihara, K. Kakushima, K. Tsutsui, A. Ogura, H. Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:	2018 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2018 - Proceedings

Volume, Number, Page

pp. 104-106

Published date

Mar. 2018

Publisher

Japanese:
English:

Conference name

Japanese:
English:	2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)

Conference site

Japanese:
English:	Kobe

DOI