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Title
Japanese:トモグラフィ解析を用いた発光分光法による誘導結合および容量結合酸素プラズマの空間分解計測 
English:Spatially Resolved Measurement of Oxygen ICP and CCP Using Optical Emission Spectroscopy with Tomographic Analysis 
Author
Japanese: 何 文涛, 清田 哲司, 土居 謙太, 山下 雄也, 菊地 航行, 叶 宇晨, 渡邊 修平, 根津 篤, 赤塚 洋.  
English: Wentao He, Tetsuji Kiyota, Kenta Doi, Yuya Yamashita, Wataru Kikuchi, Yuchen Ye, Shuhei Watanabe, Atushi Nezu, Hiroshi Akatsuka.  
Language Japanese 
Journal/Book name
Japanese:第 43 回 プラズマプロセシング研究会 プロシーディングス 
English:Proceedings of 43rd Symposium on Plasma Processing (SPP-43) 
Volume, Number, Page         pp. 59-60
Published date Jan. 15, 2026 
Publisher
Japanese:公益社団法人 応用物理学会 プラズマエレクトロニクス分科会 
English:JSAP Div. Plasma Electronics 
Conference name
Japanese:第43回プラズマプロセシング研究会 
English:The 43rd Symposium on Plasma Processing (SPP43) 
Conference site
Japanese:大阪 
English:Osaka 
Official URL https://gakkai-gran.jp/spp43/
 
Abstract Spatially resolved measurement of inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) oxygen discharges were performed using tomographic optical emission spectroscopy (OES). Reconstructed O 777.34 nm and 844.65 nm excited-state number densities, and a self-consistent actinometry–collisional radiative model (CRM) method provided the spatial distributions of dissociation degree, electron temperature T e and electron density n e. The ICP showed center-high excitation, center-high dissociation, center-high electron temperature, and center-low electron density. Meanwhile, the CCP exhibited lower excitation, asymmetric dissociation, center-high electron temperature, and high electron density near the periphery. These results reveal differences in power deposition between oxygen ICP and CCP.
Award Encouragement Award for Plasma Electronics Presentations

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