Journal Paper

• Yuchen Ye, Kenta Doi, Tetsuji Kiyota, Wataru Kikuchi, Yuya Yamashita, Atsushi Nezu, Hiroshi Akatsuka. Multiple solutions in the Te–Ne parameter space of argon CR model via Monte Carlo optimization, Plasma Sources Science and Technology, IOP Publishing, Vol. 35, No. 5, May 2026.  Official location  
• Keren Lin, Shinji Yoshimura, Michael K. T. Mo, Wataru Kikuchi, Yuya Yamashita, Jun Enomoto, Motoshi Goto, Hiroshi Akatsuka, Takayoshi Tsutsumi. Development and investigation of a large-diameter helium atmospheric-pressure plasma jet with floating electrode configuration, Japanese Journal of Applied Physics, IOP Publishing, Vol. 65, No. 2, 026002, Feb. 2026.  Official location  

Domestic Conference (Reviewed)

• Yuchen Ye, Kenta Doi, Tetsuji Kiyota, Wataru Kikuchi, Wentao He, Kazuki Shimatani, Hinata Hanyu, Yuya Yamashita, Atsushi Nezu, Hiroshi Akatsuka. Comparison of Analytical and Non-parametric Inversion Approaches for EEPFs in Ar ICP based on OES and CRM, The 73rd JSAP Spring Meeting 2026, Extended Abstracts of the 73rd JSAP Spring Meeting 2026, Japan Scociety of Applied Physics, p. 08-081, Mar. 2026.  Official location  
• Kazuki Shimatani, Tetsuji Kiyota, Kenta Doi, Yuya Yamashita, Wataru Kikuchi, Kenta Ishi, Jun Enomoto, Yuchen Ye, Atsushi Nezu, Hiroshi Akatsuka. Spatial Distribution Diagnosis of Electron Temperature and Density in Inductively Coupled Nitrogen-Argon Plasma by Tomographic OES: Validation with High-Resolution Single-Channel Spectroscopy and Langmuir Probe Measurement, The 43rd Symposium on Plasma Processing (SPP43), Proceedings of 43rd Symposium on Plasma Processing (SPP-43), JSAP Div. Plasma Electronics, pp. 61-62, Jan. 2026.  Official location  
• Wentao He, Tetsuji Kiyota, Kenta Doi, Yuya Yamashita, Wataru Kikuchi, Yuchen Ye, Shuhei Watanabe, Atushi Nezu, Hiroshi Akatsuka. Spatially Resolved Measurement of Oxygen ICP and CCP Using Optical Emission Spectroscopy with Tomographic Analysis, The 43rd Symposium on Plasma Processing (SPP43), Proceedings of 43rd Symposium on Plasma Processing (SPP-43), JSAP Div. Plasma Electronics, pp. 59-60, Jan. 2026.  Official location  

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